FeRAM
ferroelectric random access memory
DMPC
L-1,2-dimyristoyl-sn-glycero-3-phosphocholine
GID
grazing incidence X-ray diffraction
XR
X-ray reflectivity
PC
phosphocholine
EQE
external quantum efficiency
APO
aryl phosphine oxide
TMOADPO
2-(diphenylphosphoryl)-N-(2-(diphenylphosphoryl)-4-methoxyphenyl)-4-methoxy-N-(4-methoxyphenyl)aniline
HTTA
2-thenoyltrifluoroacetone
Friday, August 27, 2010
Thursday, August 26, 2010
New 10 terms
PA
phosphonic acid
PCRAM
phase change random access memory
DVD
digital versatile disk
VEC
valence-electron concentration
COHP
crystal-orbital Hamilton population
JDOS
joint density of states
PF
Poole-Frenkel
CET
complete erasure time
CD
compact disk
SIL
solid immersion lens
phosphonic acid
PCRAM
phase change random access memory
DVD
digital versatile disk
VEC
valence-electron concentration
COHP
crystal-orbital Hamilton population
JDOS
joint density of states
PF
Poole-Frenkel
CET
complete erasure time
CD
compact disk
SIL
solid immersion lens
Wednesday, August 25, 2010
New 10 terms
FD
frequency domain
SAFIR
structure-affinity relationship
AHD
aprotic highly dipolar
BC
butylene carbonate
CBILS
carbonate-based ionic liquid synthesis
GyC
glycerol carbonate
LCA
life cycle assessment
LC
lethal concentration
OC
organic carbonate
PC
propylene carbonate
frequency domain
SAFIR
structure-affinity relationship
AHD
aprotic highly dipolar
BC
butylene carbonate
CBILS
carbonate-based ionic liquid synthesis
GyC
glycerol carbonate
LCA
life cycle assessment
LC
lethal concentration
OC
organic carbonate
PC
propylene carbonate
Tuesday, August 24, 2010
New 10 terms
BE
binding energy
PBS
Public Broadcasting Service
NSTA
National Science Teachers Association
ASEE
American Society for Engineering Education
OU
University of Oklahoma
LSI
Laboratory Safety Institute
CHO
Chemical Hygiene Officer
FST
Fusion Science Theater
NRCC
National Registry of Certified Chemists
RSF
respecting sensitivity factor
binding energy
PBS
Public Broadcasting Service
NSTA
National Science Teachers Association
ASEE
American Society for Engineering Education
OU
University of Oklahoma
LSI
Laboratory Safety Institute
CHO
Chemical Hygiene Officer
FST
Fusion Science Theater
NRCC
National Registry of Certified Chemists
RSF
respecting sensitivity factor
Monday, August 23, 2010
New 10 terms
SAND
self-assembled nanodielectric
BZT
barium zirconate titanate
PEALD
plasma-enhanced atomic-layer-deposited
CYEPL
cyanoethylpullulan
PPA
poly(parabanic acid)
IBAD
ion beam-assisted deposited
CPB
cross-linked polymer blend
OSC
organic semiconductor
MIM
metal-insulator-metal
ODPA
n-octadecylphosphonic acid
self-assembled nanodielectric
BZT
barium zirconate titanate
PEALD
plasma-enhanced atomic-layer-deposited
CYEPL
cyanoethylpullulan
PPA
poly(parabanic acid)
IBAD
ion beam-assisted deposited
CPB
cross-linked polymer blend
OSC
organic semiconductor
MIM
metal-insulator-metal
ODPA
n-octadecylphosphonic acid
Friday, August 20, 2010
New 10 terms
WIW
within-wafer
PMOS
p-type metal oxide semiconductor
NMOS
n-type metal oxide semiconductor
BPSG
borophosphosilicate glass
BPTEOS
borophosphorous tetraethylorthosilicate
LDIMS
laser desorption ionization mass spectrum
SAMT
self-assembled multilayer
PTAA
polytriarylamine
SC
semiconductor
GD
gate dielectric
within-wafer
PMOS
p-type metal oxide semiconductor
NMOS
n-type metal oxide semiconductor
BPSG
borophosphosilicate glass
BPTEOS
borophosphorous tetraethylorthosilicate
LDIMS
laser desorption ionization mass spectrum
SAMT
self-assembled multilayer
PTAA
polytriarylamine
SC
semiconductor
GD
gate dielectric
Thursday, August 19, 2010
New 10 terms
MOL
middle of the line
STI
shallow trench isolation
ILD
interlevel dielectric
UTSOI
ultrathin silicon-on-insulator
ETSOI
extremely thin silicon-on-insulator
LSOI
local silicon-on-insulator
RMG
replacement metal gate
MuGFET
multigate field effect transistor
LPCVD
low-pressure chemical vapor deposition
WID
within-die
middle of the line
STI
shallow trench isolation
ILD
interlevel dielectric
UTSOI
ultrathin silicon-on-insulator
ETSOI
extremely thin silicon-on-insulator
LSOI
local silicon-on-insulator
RMG
replacement metal gate
MuGFET
multigate field effect transistor
LPCVD
low-pressure chemical vapor deposition
WID
within-die
Wednesday, August 18, 2010
New 10 terms
SSL
strong segmentation limit
PEB
poly(ethylene-co-butadiene)
NDP
nonadecylphenol
MSA
methanesulfonic acid
PDP
pentadecylphenol
NR
neutron reflectivity
SLD
scattering length density
DSA
directed self-assembly
IRS
intermediate segmentation region
LWR
line width roughness
strong segmentation limit
PEB
poly(ethylene-co-butadiene)
NDP
nonadecylphenol
MSA
methanesulfonic acid
PDP
pentadecylphenol
NR
neutron reflectivity
SLD
scattering length density
DSA
directed self-assembly
IRS
intermediate segmentation region
LWR
line width roughness
Tuesday, August 17, 2010
New 10 terms
ITRS
International Technology Roadmap for Semiconductors
TBTDET
terbutylimidotris(diethylamido)tantalum
SMFD
synchronously modulated flow and draw
AVDP
alternating vapor deposition polymerization
VDP
vapor deposition polymerization
TC
terephthaloyl chloride
PD
p-phenylenediamine
GO
graphite oxide
ARPES
angle-resolved photoemission spectroscopy
WSL
weak segmentation limit
International Technology Roadmap for Semiconductors
TBTDET
terbutylimidotris(diethylamido)tantalum
SMFD
synchronously modulated flow and draw
AVDP
alternating vapor deposition polymerization
VDP
vapor deposition polymerization
TC
terephthaloyl chloride
PD
p-phenylenediamine
GO
graphite oxide
ARPES
angle-resolved photoemission spectroscopy
WSL
weak segmentation limit
Monday, August 16, 2010
New 10 terms
CDO
carbon-doped oxide
BTESM
bis(triethoxysilyl)methane
BTESE
1,2-bis(triethoxysilyl)ethane
HBPCSO
hyperbranched polycarbosilane
MB
methane-bridged
SEI
Science and Engineering Indicators
ACWA
Assembled Chemical Weapons Alternatives
EWG
Environmental Working Group
PTEC
Physics Teacher Education Coalition Conference
CTEC
Chemistry Teacher Education Coalition
carbon-doped oxide
BTESM
bis(triethoxysilyl)methane
BTESE
1,2-bis(triethoxysilyl)ethane
HBPCSO
hyperbranched polycarbosilane
MB
methane-bridged
SEI
Science and Engineering Indicators
ACWA
Assembled Chemical Weapons Alternatives
EWG
Environmental Working Group
PTEC
Physics Teacher Education Coalition Conference
CTEC
Chemistry Teacher Education Coalition
Thursday, August 5, 2010
New 10 terms
BMO
butadiene monoxide
EP
ellipsometric porosimetry
TEFS
triethoxyfluorosilane
DFL
dielectric flash layer
TMSNB
trimethoxysilylnorbornene
TESNB
triethoxysilylnorbornene
TCS
tetra(trimethoxysilylethyl)cyclotetrasiloxane
ILD
interlayer dielectric
OPL
organic planarization layer
PSZ
pure silica zeolite
butadiene monoxide
EP
ellipsometric porosimetry
TEFS
triethoxyfluorosilane
DFL
dielectric flash layer
TMSNB
trimethoxysilylnorbornene
TESNB
triethoxysilylnorbornene
TCS
tetra(trimethoxysilylethyl)cyclotetrasiloxane
ILD
interlayer dielectric
OPL
organic planarization layer
PSZ
pure silica zeolite
Monday, August 2, 2010
New 10 terms
DMTA
mechanical thermal analysis
MELT
modified edge lift-off test
BTESP
1,2-bis(trialkoxysilyl)ethane
FPB
four-point bending
DCB
double cantilever beam
HBCSO
hyperbranched carbosiloxane
HBPCS
hyperbranched polycarbosilane
USHC
unsaturated hydrocarbon
BCHD
bicyclohexadiene
CPO
cyclopentene oxide
mechanical thermal analysis
MELT
modified edge lift-off test
BTESP
1,2-bis(trialkoxysilyl)ethane
FPB
four-point bending
DCB
double cantilever beam
HBCSO
hyperbranched carbosiloxane
HBPCS
hyperbranched polycarbosilane
USHC
unsaturated hydrocarbon
BCHD
bicyclohexadiene
CPO
cyclopentene oxide
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